CAMD Microfabrication - Special User Workshop
Microstructure Fabrication Using Optical and X-ray Lithography
Many CAMD microfabrication users often demand tall or complex shaped microstructures with small, precisely defined features. These so-called High Aspect Ratio Microstructures (HARMs) can be patterned using optical (UV) and X-ray lithography tools available at CAMD. This special workshop will introduce users to the existing capabilities and discuss in detail typical challenges.
CAMD microfabrication group invites all interested users to a
SPECIAL USER WORKSHOP
On January 22, 2008
At 9am, CAMD Conference Room
The following speakers will present about their research and other users are encouraged to briefly present their projects and HARM ideas:
Speaker 1: Daniel Park –
Large area SU-8 UV lithography and its applications to BioMEMS
The presentation will give an introduction on how SU-8 lithography can be done on large area format and how the technique can be applied to BioMEMS applications. Then I will finish up my presentation with several suggestions to improve large area SU-8 UV lithography.
Speaker 2:
Jost Goettert –
Introduction to X-ray lithography equipment and process
The presentation will describe basics of X-ray lithography and discuss the capabilities available at CAMD. It will also illustrate examples of ongoing CAMD and external customer projects.
Interested users shall send an e-mail to Shaloma Malveaux by Monday, January 19, 2008 to register for the workshop and are also invited to attach up to 5 slides to present and discuss their HARM research interest. We are looking forward to welcome you at the workshop.
