Oriel UV Exposure Station
Description:
The UV exposure station is used to expose photosensitive resist in the mid UV to deep UV range for optical lithography. It consists of a vacuum chuck designed to hold a 4" diameter substrate and a mask holder for standard 5" x 5" optical masks.
Capabilities:
- Light Source 1000 Watt Hg(Xe) lamp
- Wavelength range: ~ 220-450 nm
- Digital timer for exposure control with resolution of 0.1 seconds