The
GCA Mann 3600 pattern generator is designed for patterning standard
5" x 5" mask plates for use in optical lithography.
Pattern designs are created in AutoCAD. The AutoCAD
file is then converted into binary format, which can be fractured
into data read by the pattern generator.
The
illumination source for exposures is a high pressure Hg arc lamp.
The light is filtered and projected onto a shutter, which controls
the exposure dose. A set of aperture blades (vertical and
horizontal) can be rotated from 0 to 90 degrees to create retangular
images of varying sizes and orientations to form the pattern design.
A focusing column images the apertures onto the mask plate. The
mask plate is secured onto a fine motion stage, which positions
the plate at each exposure location.
