Bransen
Plasma Asher

An
O2 RF plasma can be used at CAMD to strip one to five microns of resist
from up to 6 four inch wafers at a time. The Bransen Asher is
run at 600W at time, temperture, or manual control.
Minor modification – The Bransen Plasma Asher reduced Nitrogen purge flow for the safe ashing of thin fragile membranes
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