The goal of the CAMD cleanroom is to provide Users with access to instrumentation required for the production of MEMS. Our cooperative work environment, mirofabrication skills, and processing and metrology equipment combine to attract researchers from industry and academia to our facility. The CAMD cleanroom is a 2500 square foot Class 100 facility. It is fully equipped to support LIGA-based microfabrication with state-of-the-art
instruments. All utilities are supplied in a "through the wall" fashion into the cleanroom. Gowning is performed in an interlocked Class 100 room located between the two large cleanrooms.
The CAMD staff provides expertise in processing, photolithography, thin film deposition, electroplating, and metrology. CAMD has the capability to generate sub-micron structures in optical photoresist,
based on the User's design, for creation of molds or x-ray masks. Optical masks with features as small as five micrometers are realized with the Mann pattern generator. Thin films can be deposited for many different metal layers through e-beam or sputter deposition. SEM analysis, interferometric capabilities, thermal analyses, and scanning tip measurements provide a variety of metrological tools for use by trained researchers. Use of the cleanroom facilities requires following the procedures described in the following guides:
(The following documents are in .pdf format)
